G - Physics – 03 – F
Patent
G - Physics
03
F
96/172, 400/4025
G03F 7/033 (2006.01)
Patent
CA 1255412
Abstract of the Disclosure: A photosensitive resin composition comprising components A, B and C described below is provided. The composition of the present invention is quite effectively usable for the preparation of photo- sensitive resin printing plates having excellent water developability, image reproducibility and printability. The composition comprises: A. 100 parts by weight of a completely or partially saponified polyvinyl acetate having a degree of saponification of 50 to 100 mole %, B. 20 to 300 parts by weight of a photopoly- merizable monomer having at least one ethylenically unsaturated bond in the molecule, and C. 1 to 50 parts by weight of a polymer obtained by homopolymerizing a polymerizable unsaturated monomer having the following groups (1) and (2) in the molecule or copoly- merizing the same with another unsaturated monomer: (1) (2) Image Image wherein R1 represents H or CH3 and R2 and R3 repre- sent each an alkyl group having 1 to 10 carbon atoms.
456765
Fujikawa Junichi
Kashio Shigetora
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
Toray Industries Inc.
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