G - Physics – 03 – F
Patent
G - Physics
03
F
96/172, 96/177
G03F 7/038 (2006.01) G03F 7/027 (2006.01) H05K 3/00 (2006.01)
Patent
CA 2035148
- 37 - ABSTRACT OF THE DISCLOSURE Disclosed is a photosensitive resin composition which has improved water developability and storage stability. The composition comprises (I) crosslinked resin particles prepared by a post-emulsion method from (a) a base resin having a glass transition temperature (Tg) of 0 °C or less and a polymerizable double bond, (b) a monomer which, when polymerized, provides a resin in which Tg is 20 °C higher than that of the base resin, or a resin in which Tg is 20 °C higher than that of the base resin, (c) a polyvinyl compound, and (d) a polymerization initiator (II) a photopolymerizable unsaturated monomer, and (III) a photopolymerization initiator.
Ishii Keizou
Ishikura Shinichi
Muramoto Hisaichi
Ninomiya Yusuke
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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