G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/004 (2006.01) G03F 7/09 (2006.01) G03F 7/115 (2006.01)
Patent
CA 2044785
-18- ABSTRACT OF THE DISCLOSURE Disclosed is a photosensitive resin plate which effectively prevents dot gain by covering the photosensitive resin layer with a specific matte layer. The photosensitive resin plate comprises a substrate, a photosensitive resin layer formed on the substrate and a resin matte layer formed on the photosensitive resin layer, wherein the resin matte layer contains a polymerization inhibiting material.
Kanda Kazunori
Konishi Katsuji
Ueda Koichi
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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