C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/152, 260/636.
C07C 43/12 (2006.01) B41N 3/06 (2006.01) G03F 7/004 (2006.01)
Patent
CA 1232915
ABSTRACT A surfactant which reduces contamination in resin based printing plates is combined with the photosensitive resin and eliminates the need to separately pretreat the plates. The surfactant is preferably a nonionic fluorocarbon with four to fourteen perfluoroalkyl groups or mixtures thereof. Case 2735
445119
Grace (w.r.) K.k.
Smart & Biggar
LandOfFree
Photosensitive resin compositions does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photosensitive resin compositions, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photosensitive resin compositions will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1216801