G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/028 (2006.01) G03F 7/033 (2006.01)
Patent
CA 2113741
43 ABSTRACT OF THE DISCLOSURE Novel water-developable photosensitive resin composition having excellent balance of properties with excellent strength of resin plate after photosetting, favorable elongation at rupture, impact resilience and the like is provided. The photosensitive resin composition contains (1) a photopolymerizable copolymer made by introducing a photopolymerizable group into a copolymer made from the monomer mixture mainly containing (i) an aliphatic conjugated diene, (ii) a carboxyl group-containing ethylenic unsaturated monomer and (iii) a compound having at least two polymerizable unsaturated groups, (2) a photopolymerizable unsaturated monomer,(3) an amino group- containing compound and (4) a photopolymerization initiator.
Hayashi Tadashi
Kanda Kazunori
Koshimura Katsuo
Kusuda Hidefumi
Sato Hozumi
Japan Synthetic Rubber Co. Ltd.
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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