Phthalimide compounds for forming amorphous layers by vacuum...

Details Phthalimide compounds for forming amorphous layers by vacuum... Phthalimide compounds for forming amorphous layers by vacuum...

C - Chemistry, Metallurgy

07

D

260/306.05, 260/

C07D 209/48 (2006.01) C07D 401/12 (2006.01) C07D 405/12 (2006.01)

Patent

CA 2002865

PHTHALIMIDE COMPOUNDS FOR FORMING AMORPHOUS LAYERS BY VACUUM DEPOSITION Abstract There are disclosed phthalimide compounds of the structure: Image wherein R and R1 are independently selected from the group consisting of nitro, foramido groups, carbamoyl groups and heterocyclic groups derived from amino or carboxyl groups.

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