C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 7/02 (2006.01) A01N 43/16 (2006.01) C07H 13/04 (2006.01) C07H 15/04 (2006.01)
Patent
CA 2092675
TRACT OF THE DISCLOSURE The present invention relates to compounds represented by the following formula (I) Image (I) (wherein R1, R2, R3, R4, and R5 independently represent a hydrogen atom or an acetyl or benzyl group, R3 represents a hydrogen atom, a hydroxyl, acetoxy, or benzyloxy group, R7 represents a hydrogen atom, or R6 and R7 together may represent another direct bond, and R3 represents a carboxyl, methoxycarbonyl, hydroxymethyl, or acetoxymethyl group) or salts thereof and a process for the preparation thereof, as well as their utilities in a method for culture, a method for the growth inhibition of moyashi roots, and a method for the growth promotion of moyashi hypocotyls.
Hasegawa Koji
Kakuta Hideo
Mizutani Junya
Research Development Corporation Of Japan
Smart & Biggar
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