C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 295/15 (2006.01) A61K 31/495 (2006.01) A61K 31/535 (2006.01) A61K 31/55 (2006.01) C07D 213/56 (2006.01) C07D 241/04 (2006.01) C07D 295/185 (2006.01) C07D 401/06 (2006.01) C07D 401/14 (2006.01) C07D 403/06 (2006.01) C07D 405/06 (2006.01) C07D 409/06 (2006.01) C07D 413/06 (2006.01)
Patent
CA 2071940
2071940 9206960 PCTABS00012 Compounds of formula (I), where A is an alkylene chain of 1 or 2 carbon atoms optionally substituted by one or more lower alkyl groups, R is hydrogen or lower alkyl, R1 is a mono or bicyclic aryl or a heteroaryl radical, R2 is an aryl radical, a heteroaryl radical, or an aryl- or heteroaryl-lower alkyl radical, R3 is hydrogen, lower alkyl or aryl and R4 is hydrogen, lower alkyl, cycloalkyl, cycloalkyl(lower)alkyl, aryl, or aryl(lower)alkyl or R3 and R4 together with the nitrogen atom to which they are both attached represent a saturated heterocyclic ring which may contain a further hetero atom and the dotted line represents a single or double bond, the hydrogen atoms shown in brackets being present when the dotted line represents a single bond and their pharmaceutically acceptable acid addition salts are 5-HT1A binding agents which may be used, for example, for the treatment of CNS disorders such as anxiety.
Cliffe Ian A.
Ifill Anderson D.
White Alan C.
John Wyeth & Brother Limited
Ridout & Maybee Llp
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