C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/220, 260/242
C07D 473/10 (2006.01) A61K 31/52 (2006.01)
Patent
CA 1223875
22500-FF ABSTRACT OF THE DISCLOSURE New compounds of the formula (I) Image and the pharmaceutically acceptable acid addition salts thereof, wherein Z1 and Z2 are each independently selected from the group consisting of CH2, CHOB anad C=O, wherein B is selected from the group consisting of hydrogen and alkanoyl; Y is oxygen or sulfur, n is an integer from 0-4 but cannot be zero when Z1 is CHOB: m is an integer from 1-4; and R1, R2 and R3 are each independently hydrogen, halogen, hydroxy, trifluoromethyl, alkyl or alkoxy; are antihistamines and are therefore useful in the treatment of respiratory diseases including asthma, hay fever, allergies and the common cold. They are also vasodilators and can be used for prevention and/or treatment of myocardial infarction.
408488
Beranger Serge
Favier Colette
Pascal Jean-Claude
Pinhas Henri
Johnson Douglas S. Q.c.
Laroche-Navarron S.a.
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