C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/290.2, 260/2
C07D 211/58 (2006.01)
Patent
CA 1094075
Abstract of the Disclosure Compounds and process for their preparation, of formula Image I [wherein R represents a lower alkoxy or allyloxy goup; R1 represents ahydrogen atom R' and R2, which may be the same or different, each represent a halogen atom, or a sulphamoyl, amino, lower alkylamino di(lower)alkylamino, lower alkylsulphonyl or lower alkylsulphamoyl group, or a lower acylamino group in which the acyl moiety is derived from a carboxylic acid, the halogen atom or group represented by the symbol R1 being in the 3- or 4-position of the phenyl ring; R3 represents a hydrogen atom or a lower alkyl group, R4 represents a cyclohexenyl or cyclohexadienyl group optionally substituted by an alkyl group containing 1 to 3 carbon atoms] and pharmaceutically-acceptable acid addition salts and quaternary ammonium derivatives and N-oxides thereof. These compounds find pharmaceutical use as agents to antagonize tho effects of dopamino and dopaminoergic agents.
271917
Iglesias Jose Boix
Mauri Jacinto Moragues
Noverola Armando Vega
Soto Jose-Manuel Prieto
Spickett Robert Geoffrey William
Fetherstonhaugh & Co.
Gallardo (antonio) S.a.
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