C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 498/06 (2006.01) A61K 31/47 (2006.01) A61K 31/535 (2006.01) C07D 471/06 (2006.01)
Patent
CA 2171579
A compound of formula (I) Image (I) in which X represents an oxygen atom or a methylene group, R1 represents a chlorine or fluorine atom or a methyl, methoxy or amino group, and R2 and R3 independently represent a hydrogen atom or a methyl group, in the form of the free base or an addition salt with a pharmaceutically acceptable acid, processes for their preparation and their application in therapeutics.
Aletru Michel
Defosse Gerard
Even Luc
Jegham Samir
Kirby Eades Gale Baker
Synthelabo
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