C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
400/7080, 260/24
C07D 401/14 (2006.01) C07D 405/14 (2006.01) C08K 5/34 (2006.01) C08K 5/3435 (2006.01) C08K 5/3492 (2006.01)
Patent
CA 1323875
ABSTRACT New compounds of formula (I): Image [I] [in which: R1 is hydrogen, alkyl, alkoxyalkyl, carboxylic acyl or phenylalkyl, or an optionally substituted tetramethylpiperidyl group; R2 is hydrogen, alkyl, carboxylic acyl or phenylalkyl group; R3 is alkylene optionally interrupted by at least one oxygen atom; X is oxygen or -NR5- (in which R5 is hydrogen or alkyl): Y is -OCO-, -COO-, -CONH- or -OCONH-; n is 2 to 4: and, when n is 2, Z is alkylene optionally interrupted by at least one oxygen, sulfur or aryl, cycloalkyl or heterocyclic group, or, when n is 3, Z is alkanetriyl in which a carbon is optionally replaced by nitrogen or, when n is 4, Z is alkanetetrayl optionally interrupted by at least one oxygen atom] and acid addition salts thereof are valuable polymer stabilizers.
581777
Naito Satoru
Osawa Hisayu
Toda Toshimasa
Yamazaki Takaaki
Marks & Clerk
Sankyo Company Limited
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