Planar narrow-stripe laser with improved contact resistance

Details Planar narrow-stripe laser with improved contact resistance Planar narrow-stripe laser with improved contact resistance

H - Electricity

01

S

345/32

H01S 5/20 (2006.01)

Patent

CA 1189177

A PLANAR NARROW-STRIPE LASER WITH IMPROVED CONTACT RESISTANCE Abstract of the Disclosure Double heterostructure lasers which use a narrow stripe contact exhibit linear characteristics with a low lasing threshold current making them suitable for fiber optic communication systems. Unfortunately as the stripe is reduced in width, the contact resistance increases thereby affecting the frequency response of the device and increasing its operating temperature. To overcome these problems while retaining high linearity and low threshold current, a two part diffusion is proposed, one shallow large area diffusion to reduce contact resistance, and a deep narrow diffusion extending close to the active layer to confine the lasing region. -i-

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