Planarized ceramic substrates

Details Planarized ceramic substrates Planarized ceramic substrates

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B05D 3/06 (2006.01) B32B 18/00 (2006.01) C04B 41/45 (2006.01) H05K 1/03 (2006.01) H05K 3/00 (2006.01)

Patent

CA 1257154

PLANARIZED CERAMIC SUBSTRATES ABSTRACT A method of planarizing or smoothing the surface of a ceramic substrate by deposition of a silicon nitride layer. The silicon nitride in addition to planarizing the surface forms an alpha particle barrier. The substrates suitable for planarization with silicon nitride in accordance with the method of the present invention are sintered oxide particles which are bonded with a silicon bonding phase. The silicon content of the silicon bonding phase is greater than the silicon content of the aggregate of the oxide particles. The silicon nitride is preferably deposited by plasma enhanced chemical vapor deposition, and the silicon bonding phase is preferably a glass.

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