Plasma-depositing insulation layer on metal and then...

C - Chemistry – Metallurgy – 23 – C

Patent

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204/96.1, 204/96

C23C 14/02 (2006.01) C23C 14/56 (2006.01) C23C 16/02 (2006.01) H01L 31/0392 (2006.01) H01L 31/04 (2006.01) H01L 31/18 (2006.01) H01L 31/20 (2006.01) H05K 1/05 (2006.01)

Patent

CA 1267864

ABSTRACT OF THE DISCLOSURE A process for producing a continuous web of an insulated metalic substrate, comprising the steps of depositing an insulation layer on a continuous web of a metallic substrate by plasma CVD method or sputtering method, and depositing a back electrode on the insulation layer by sputtering method or vapor deposition method. According to the present invention, the insulated metalic substrate for a solar cell or printed circuit board can be produced in a continuous manner and in high productivity and quality.

468803

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