Plasma emission source

H - Electricity – 05 – H

Patent

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327/72

H05H 1/30 (2006.01) H05H 1/36 (2006.01)

Patent

CA 1245729

Abstract of the Disclosure An impedance matching network for continuously and automatically maximizing RF power transfer from an R.F. power generator to a plasma emission torch having an R.F. load coil associated therewith which receives R.F. power from the generator, includes a dual phase detector network. Signals from the detector network control, via a control unit, a variable impedance network.

472670

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