Plasma method of producing selective particle sized oxide,...

Details Plasma method of producing selective particle sized oxide,... Plasma method of producing selective particle sized oxide,...

H - Electricity

01

T

204/175, 204/96.

H01T 19/00 (2006.01) C01B 13/14 (2006.01)

Patent

CA 1096328

Abstract of the Disclosure A plasma method and apparatus produce oxide having average diameters determined by adjustment of process conditions. Feed material is fed into a plasma environment and vaporized. Subsequently, effluent containing the vaporized feed from the reaction is passed into a quenching zone where it is subjected to a quenching medium, the volume, velo- city and direction of which are adjustable to determine outputparticle size characteristics. Feed material may be an oxide per se or one which forms an oxide in situ through reduction and/or oxidation.

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