Plasma passivation technique for the prevention of post etch...

Details Plasma passivation technique for the prevention of post etch... Plasma passivation technique for the prevention of post etch...

H - Electricity

01

L

204/96.05

H01L 21/3213 (2006.01) C23F 4/00 (2006.01)

Patent

CA 1151106

F-1466 PLASMA PASSIVATION TECHNIQUE FOR THE PREVENTION OF POST-ETCH CORROSION OF PLASMA-ETCHED ALUMINUM FILMS By Christopher H. Galfo and Ashok L. Nalamwar Abstract A method for preventing the post-etch corrosion of aluminum or aluminum alloy film which has been etched utilizing chlorinated plasma wherein the etched film is exposed to flourinated plasma.

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