H - Electricity – 05 – H
Patent
H - Electricity
05
H
H05H 1/24 (2006.01) H01L 21/205 (2006.01) H01L 21/3065 (2006.01)
Patent
CA 2524484
A plasma processing apparatus is disclosed which comprises a conductive member (51) arranged on a side of each electrode (31, 32) which faces a work (W) with an insulating member (41) intervening therebetween. Namely, the insulating member (41) is interposed between the each electrode (31, 32) and the conductive member (51). The dielectric constant and thickness of the insulating member (41) are so set that a voltage applied to a gap (40b) between the insulating member (41) and the conductive member (51) is lower than the sparking voltage. Consequently, electric discharge in the gap (40b) can be prevented, thereby improving process quality.
L'invention concerne un appareil de traitement au plasma comprenant un élément conducteur (51) disposé sur un côté de chacune des électrode (31, 32) placées face à une pièce (W), et séparé de l'électrode par un élément isolant (41). L'élément isolant (41) est intercalé entre chaque électrode (31, 32) et l'élément conducteur (51). La constante diélectrique et l'épaisseur de l'élément isolant (41) sont définis de telle manière que la tension appliquée au niveau de l'espace (40b) séparant l'élément isolant (41) de l'élément conducteur (51) est inférieure à la tension d'amorçage. La formation de décharges électriques peut ainsi être évitée dans l'espace (40b), ce qui permet d'améliorer la qualité de traitement.
Hino Mamoru
Ito Takumi
Mayumi Satoshi
Ono Takayuki
Uehara Tsuyoshi
Marks & Clerk
Sekisui Chemical Co. Ltd.
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