Plasma processing method and apparatus

Details Plasma processing method and apparatus Plasma processing method and apparatus

H - Electricity

01

J

H01J 7/24 (2006.01) F28D 7/00 (2006.01) H05H 1/24 (2006.01) H05H 1/46 (2006.01)

Patent

CA 2409747

A plasma processing apparatus (10) includes a first chamber (14) having a first wall with an inner peripheral surface and an outlet (16). A plurality of fluid supplying outlets (80) are disposed along the first wall and are configured to supply a cooling fluid into the first chamber that travels in a circumferential direction around the inner peripheral surface to the first wall and in a direction towards the outlet (16). The cooling fluid exiting the plurality of fluid supplying outlets forms a cooling layer for cooling the inner peripheral surface of the first wall, and the outlet is configured for allowing the cooling fluid to exit therethrough while retaining the plasma within the chamber.

L'invention concerne un dispositif de traitement au plasma qui comprend une première chambre dotée d'une première paroi à surface périphérique interne et d'une évacuation. Plusieurs sorties d'alimentation de fluide sont placées le long de la première paroi, conçues pour fournir un fluide de refroidissement à la première chambre selon un déplacement circonférentiel autour de la surface périphérique interne de la première paroi, en direction de l'évacuation. Le fluide de refroidissement fourni par la pluralité de sorties forme une couche de refroidissement qui refroidit la surface périphérique interne de la première paroi, et l'évacuation est conçue pour assurer la sortie du fluide de refroidissement avec maintien simultané du plasma dans la chambre.

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