Plasma processor for large workpieces

Details Plasma processor for large workpieces Plasma processor for large workpieces

H - Electricity

05

H

H05H 1/46 (2006.01) H01J 37/32 (2006.01) H01L 21/00 (2006.01) H01L 21/3065 (2006.01)

Patent

CA 2206679

A plasma processor for large workpieces includes a vacuum chamber having plural individually supported dielectric windows for coupling an r.f. field originating outside of the chamber into the chamber to excite the plasma. A planar coil for inductively deriving the field has plural segments with the same electrical length, each including an element connected in parallel with an element of another segment.

Processeur au plasma pour pièces de grandes dimensions qui comporte une enceinte à vide dotée de plusieurs fenêtres diélectriques à support individuel, destinées à coupler un champ de radiofréquence provenant de l'extérieur de l'enceinte à l'intérieur de l'enceinte afin d'exciter le plasma. Une bobine plate destinée à dériver le champ par induction possède plusieurs segments de même longueur électrique, chacun comprenant un élément connecté en parallèle à un élément d'un autre segment.

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