Plasma reactor and method for removing photoresist

Details Plasma reactor and method for removing photoresist Plasma reactor and method for removing photoresist

H - Electricity

05

H

356/177, 358/22,

H05H 1/46 (2006.01) B23K 9/00 (2006.01) G03F 7/42 (2006.01) H01J 37/32 (2006.01)

Patent

CA 1281439

Abstract PLASMA REACTOR AND METHOD FOR REMOVING PHOTORESIST A plasma reactor comprises a working chamber that has at least one entry port. The working chamber is adapted to receive at least one article. The entry port is adapted to receive a working gas into the working chamber. An elec- trical energy generator is provided. The plasma reactor includes at least one pair of electrodes which are posi- tioned adjacent the working chamber entry port. The elec- trodes, which are connected to the generator, create an electric field adjacent the entry port that converts the working gas into a working plasma for interacting with a material of the article. The article to be processed is placed in a part of the working chamber which is free from electric fields. An electric field-free region downstream of the plasma generating region is provided in which the article is positioned.

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