Plural foils shaping intensity profile of ion beams

Details Plural foils shaping intensity profile of ion beams Plural foils shaping intensity profile of ion beams

H - Electricity

05

H

H05H 13/00 (2006.01) G21K 1/093 (2006.01) G21K 1/14 (2006.01) H05H 7/10 (2006.01)

Patent

CA 2389501

The invention presents an approach that uses plural separated foils to shape an ion beam so that the intensity density of hot spots in the ion beam is lowered. More particularly, plural foils are placed in close proximity to each other, wherein at least one foil intercepts a portion of the beam to strip a charge from ions in different portions of the beam at different times, and thus, shape the ion beam. At a basic level, the inventive approach places plural foils so that the distance between planes of successive foils is a fraction of the radius of curvature of the beam's cyclotron orbit.

L'invention concerne un procédé consistant à utiliser une pluralité de feuilles distinctes pour mettre en forme un faisceau d'ions de manière à abaisser la densité de l'intensité des points chauds (hot spots) du faisceau d'ions. De manière plus spécifique, plusieurs feuilles sont disposées très proches les unes des autres, et au moins une feuille intercepte une partie du faisceau afin d'arracher une charge des ions dans différents parties du faisceau à des moments différents, et de produire ainsi une mise en forme du faisceau d'ions. Le principe de base de ce procédé consiste à disposer une pluralité de feuilles de manière que la distance entre les plans des feuilles successives correspond à une fraction du rayon de courbure de l'orbite cyclotron.

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