G - Physics – 21 – K
Patent
G - Physics
21
K
358/27, 316/8
G21K 1/06 (2006.01)
Patent
CA 1223092
ABSTRACT OF THE DISCLOSURE Point source X-ray focusing device struc- tures, materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices include one or more focusing elements which each have a focusing sur- face with a plurality of layer pairs formed there- on. The focusing surface and the layer pairs are designed to collect, reflect and concentrate the maximum X-ray flux from a point source to a focus point for a particular wavelength of interest.
463475
Keem John E.
Marshall Gerald F.
Macrae & Co.
Ovonic Synthetic Materials Company Inc.
LandOfFree
Point source x-ray focusing device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Point source x-ray focusing device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Point source x-ray focusing device will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1273151