Point source x-ray focusing device

G - Physics – 21 – K

Patent

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358/27, 316/8

G21K 1/06 (2006.01)

Patent

CA 1223092

ABSTRACT OF THE DISCLOSURE Point source X-ray focusing device struc- tures, materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices include one or more focusing elements which each have a focusing sur- face with a plurality of layer pairs formed there- on. The focusing surface and the layer pairs are designed to collect, reflect and concentrate the maximum X-ray flux from a point source to a focus point for a particular wavelength of interest.

463475

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