C - Chemistry – Metallurgy – 09 – G
Patent
C - Chemistry, Metallurgy
09
G
C09G 1/12 (2006.01) C09G 1/16 (2006.01)
Patent
CA 2081877
POLISH CONTAINING DERIVATIZED AMINE FUNCTIONAL ORGANOSILICON COMPOUNDS ABSTRACT A polish formulation containing as components thereof at least one member selected from the group consisting of waxes, solvents, surfactants, thickening agents, abrasives, dyes, odorants and other ingredients normally used in making polishes. The improvement resides in incorporating into the polish formulation a derivatized amine functional organosilicon compound.
Cifuentes Martin Eric
Selley David Brian
Dow Corning Corporation
Gowling Lafleur Henderson Llp
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