C - Chemistry – Metallurgy – 09 – G
Patent
C - Chemistry, Metallurgy
09
G
C09G 1/02 (2006.01) B24B 37/04 (2006.01) B24B 57/02 (2006.01) G11B 5/84 (2006.01) C09K 3/14 (2006.01)
Patent
CA 2407800
For aluminum disks and glass-made hard disks, those disks having a mean waviness of less than 3 A are being desired in order to increase the density of memory capacity. The present invention provides polishing compositions that can give smoothly polished surfaces for the disks. The polishing compositions are polishing compositions for aluminum disks or substrates having silica on the surface thereof, which contain colloidal silica particle groups having different particle size distributions and have a SiO2 concentration of 0.5 to 50% by weight.
L'invention concerne des disques durs en aluminium et en verre. Ces disques, qui présentent une ondulation moyenne inférieure à 3 angströms, sont prévus pour augmenter la densité de capacité de mémoire. La présente invention concerne également des compositions de polissage grâce auxquelles les surfaces des disques peuvent être polies de manière régulière. Lesdites compositions de polissage conviennent aux disques ou substrats en aluminium présentant de la silice sur leur surface. Ces compositions contiennent des groupes de particules de silice colloïdales de tailles différentes et d'une concentration de SiO2 comprise entre 0,5 et 50 % en poids.
Nishimura Tohru
Ota Isao
Yamada Gen
Gowling Lafleur Henderson Llp
Nissan Chemical Industries Ltd.
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