Polishing pad having micro-grooves on the pad surface

Details Polishing pad having micro-grooves on the pad surface Polishing pad having micro-grooves on the pad surface

B - Operations, Transporting

24

B

B24B 37/04 (2006.01) B24D 11/00 (2006.01) B24D 13/14 (2006.01)

Patent

CA 2658127

A polishing pad is provided herein, which may include a plurality of soluble fibers having a diameter in the range of about 5 to 80 micrometers, and an insoluble component. The pad may also pad include a first surface having a plurality of micro-grooves, wherein the soluble fibers form the micro-grooves in the pad. The micro-grooves may have a width and/or depth up to about 150 micrometers. In addition, a method of forming the polishing pad and a method of polishing a surface with the polishing pad is disclosed.

La présente invention concerne un tampon de polissage qui peut comprendre une pluralité de fibres solubles dont le diamètre est compris entre environ 5 et 80 micromètres, et un composant insoluble. Le tampon peut également comprendre une première surface comportant une pluralité de microsillons, les fibres solubles constituant les microsillons du tampon. La largeur et/ou la profondeur des microsillons peut (peuvent) atteindre environ 150 micromètres. L'invention concerne de plus un procédé de fabrication du tampon de polissage et un procédé de polissage de surface au moyen du tampon de polissage.

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