C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/33, 260/468,
C08G 4/00 (2006.01) C07C 69/36 (2006.01) C08G 59/42 (2006.01) C08G 65/332 (2006.01) C08G 65/337 (2006.01) C08L 59/00 (2006.01)
Patent
CA 2007519
- 1 - Abstract The present invention provides a poly(alpha- ketoester) compound represented by the formula (1); (I) Image wherein G is a residue of an active hydrogen-containing compound G-(X-H)n, or an alkyl, aryl, aralkyl, alkenyl, alkynyl group having 3 to 20 carbon atoms which may contain oxygen or nitrogen atoms, or a polymeric compound residue, X is an oxygen atom or -CH2, n is an integer of 3 to 1,000, R1 is a hydrogen atom, a C1-C5 alkyl group or an aryl group, and a process for production thereof. The compounds of the present invention are suitable for use in paints, adhesives, electronic materials and the like. They may be combined with a polyol to form a curable composition suitable for coating or as an adhesive.
Aoki Kei
Mori Hirohiko
Takagawa Ryozo
Tomita Nobuaki
Kirby Eades Gale Baker
Nippon Paint Co. Ltd.
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