C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
400/2011
C08G 69/50 (2006.01) C08G 2/38 (2006.01)
Patent
CA 1046686
ABSTRACT OF THE DISCLOSURE Block copolymer of the structure A-B, wherein - A polylactamic block of recurring units Image wherein PM is linear polymethylene chain having from 3 to 13 carbon atoms, - B is a polyoxymethylene block of recurring units [CH2O]. The block copolymer contains at least 2 wt.% of block B and at least 0.05 wt.% of block A. The block copolymer can be used as technopolymer when rich in block B, or in the field of yarns and molded products when ?ch in block A.
241987
Bianchi Gaudenzio
Colombo Daniele
Colombo Paolo
Radici Pierino
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