C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 69/34 (2006.01) C08G 69/26 (2006.01) C09D 11/10 (2006.01)
Patent
CA 2105163
2105163 9216578 PCTABS00016 A polyamide resin adapted for use in thermographic inks prepared from certain dimer acids and monomeric acids and a mixture of a diamine and polyamine. The alkylene diamines and triamines, such as ethylene diamine and diethylene triamine, are preferred. With oleic acid dimer the monomeric acids are preferably stearic or isostearic acids and mixtures thereof. With the dimer of polyunsaturated acids the monomeric acid may also be the monomer residue from dimerized oleic acid.
Lovald Roger A.
Van Beek Donald A.
Fetherstonhaugh & Co.
Henkel Corporation
Lovald Roger A.
Van Beek Donald A.
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