C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/190, 96/55
C08G 63/66 (2006.01) C08G 63/688 (2006.01) G03G 9/13 (2006.01) G03G 9/16 (2006.01)
Patent
CA 1131392
Abstract of the Disclosure Polyesterionomers having the structure Image wherein G1 represents a straight or branched chain alkylene having about 2 to 12 carbon atoms, or, substituted or unsubstituted cycloalkylene, cycloalkylenebis(oxyalkylene) or cycloalkylenedialkylene; G2 represents, substituted and unsubstituted, arylene, cycloalkylene or a straight or branched chain oxygen free alkylene having about 2 to 12 carbon atoms; R and Ar, which are always different, represent 1,1,3-trimethyl-3-phenylindan-5, 4'-diyl, or an unsaturated, substituted or unsubstituted alicyclic group having 7-10 carbon atoms or a substituted or unsubstituted moiety selected from the group consisting of alkylene, cycloalkylene, sulfonyl- diarylene, arylene, arylenevinylene, arylenealkylene, arylene- bisvinylene or arylenebisalkylene; A represents a sulfoarylene, sulfoaryloxyarylene, sulfocycloalkylene, iminodisulfonylarylene, iminobis(sul- fonylarylene), sulfoaryloxysulfonylarylene and sulfoaralkyl- arylene or the alkali metal or ammonium salt thereof; said G1, G2, R and Ar substituents are selected from the group consisting of alkyl, alkoxy, nitro, carboxyl, halo and cyano; w is about 50 to about 100, preferably, 65 to 100 mole percent of the total diol component; and of the total acid component; x is about 25 to about 95 mole percent; y is about 1 to about 74 mole percent; and z is about 4 to about 15 mole percent.
325721
Hartman Susan E.
Merrill Stewart H.
Noonan John M.
Sandhu Mohammad A.
Santilli Domenic
Eastman Kodak Company
Gowling Lafleur Henderson Llp
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