Polyether-ester amide and permanently antistatic resin...

C - Chemistry – Metallurgy – 08 – G

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402/183, 400/201

C08G 69/44 (2006.01) C08L 51/04 (2006.01) C08L 77/12 (2006.01)

Patent

CA 1302623

ABSTRACT OF THE DISCLOSURE A transparent polyether-ester amide having a permanently antistatic property is obtained by copolymerizing (a) an aminocarboxylic acid, a lactam, or a salt derived from a diamine and a dicarboxylic acid; (b) a diol of the formula: Image (I), Image (II) and Image (III) wherein R1 and R2 are an ethylene oxide or propylene oxide group, Y is covalent bond, alkylene, alkylidene, cycloalkylidene, arylalkylidene, O, SO, SO2 , CO, S, CF2 , C(CF3)2 or NH, X is H, alkyl, halogen, sulfonic acid or salt thereof, ? is 0 or an integer of 1 - 4, and m and n an integer of 1 - 15; (c) a poly(alkylene oxide)glycol or a diol of the formula: HO - R3 - OH (IV) wherein R3 is alkylene, alkylidene, cycloalkylidene or arylalkylidene; and (d) a dicarboxylic acid; wherein the content of the polyether-ester units is 10 to 90 wt.%. The polyether-ester amide is used preferably as a blend thereof with a graft copolymerization product formed by graft-polymerizing (a) a rubbery polymer with (b) a monomer mixture of a methacrylic or acrylic acid ester, an aromatic vinyl monomer and an optional vinyl cyanide monomer, this product having a refractive index approxi- mately similar to that of the polyether-ester amide.

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