C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 39/15 (2006.01) C08G 8/10 (2006.01) C08G 59/02 (2006.01) C08G 59/08 (2006.01) C08G 59/32 (2006.01) C08G 59/62 (2006.01)
Patent
CA 2079991
ABSTRACT OF THE DISCLOSURE A novel polyhydric phenol represented by the general formula: Image wherein R1 to R4 independently represent hydrogen, an alkyl or cycloalkyl group having 1 to 9 carbon atoms, or halogen, and X represents hydrogen, an alkyl group having 1 to 9 carbon atoms, or an aryl group, and n represents an average number of repeating units of 0.1 to 10. With the above polyhydric phenol as starting material, there is provided an epoxy resin represented by the general formula: Image wherein R1 to R4, X and n are as defined above. There is provided an epoxy resin composition comprising the above epoxy resin and a curing agent. The cured products from the above epoxy resin are excellent in less hygroscopicity and have a balance between thermal resistance and curing performance.
Kanagawa Shuichi
Morimoto Takashi
Naitoh Shigeki
Saito Noriaki
Shiomi Yutaka
Fetherstonhaugh & Co.
Sumitomo Chemical Co. Ltd.
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