Polyhydric phenol compound and positive resist composition...

Details Polyhydric phenol compound and positive resist composition... Polyhydric phenol compound and positive resist composition...

C - Chemistry, Metallurgy

07

D

C07D 311/60 (2006.01) C07D 311/64 (2006.01) G03F 7/016 (2006.01) G03F 7/022 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2062861

-17- ABSTRACT OF THE DISCLOSURE A polyhydric phenol compound of the formula: Image (I) wherein R1 to R5 are independently a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, provided that at least one of R1 and R2 is an alkyl group, an alkenyl group, a cycloalkyl group or an aryl group, and its quinone diazide sulfonate which gives a posi- tive resist composition having improved sensitivity and a good depth of focus.

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