C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
402/221, 400/460
C08L 79/08 (2006.01) B29C 47/78 (2006.01) C08G 73/10 (2006.01) C08J 5/18 (2006.01)
Patent
CA 2000921
26520-30 ABSTRACT OF THE DISCLOSURE The polyimide sheets having excellent thermal resist- ance and good surface appearance of the resultant sheets is obtained by melt-extrusion process from specific polyimide in the temperature range of 300 °C to 450 °C and controlling the moisture content to 200 ppm or less in the polyimide used as raw materials. The specific polyimide has recurring units of the formula: Image (I) (wherein R is a tetravalent radical selected from the group consisting of an aliphatic radical having two or more carbon atoms, a cyclo-aliphatic radical, a monoaromatic radical, a condensed polyaromatic radical and a non-condensed polyaromatic radical wherein the aromatic radicals are mutually connected with a bond or a crosslinking function, X is a divalent radical of a single bond, sulfur atom, sulfonyl radical, carbonyl radical, isopropylidene radical, or hexafluoroisopropylidene radical).
Moriya Shinobu
Nakakura Toshiyuki
Nakano Masami
Ohta Masahiro
Saruwatari Masumi
Fetherstonhaugh & Co.
Mitsui Chemicals Incorporated
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