Polymer composition which masks odor

C - Chemistry – Metallurgy – 08 – L

Patent

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Details

C08L 101/00 (2006.01) C08K 5/06 (2006.01) C08L 79/08 (2006.01)

Patent

CA 2051469

ABSTRACT OF THE DISCLOSURE The present invention provides polymer compositions such as for instance, polyglutarimide and meth(acrylic)polymers to which is added a phenylethyl cyclohexyl ether of the following structure Image wherein Rl, R2, R3, and R4 are the same or different substituents selected from methyl or hydrogen. The phenylethyl cyclohexyl ether additive masks undesirable odors which are present during high temperature processing of the polymer, and in addition it does not create undesirable results, side reactions and discoloration problems in the polymer compositions.

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