Polymeric composition having enhanced resistance to...

Details Polymeric composition having enhanced resistance to... Polymeric composition having enhanced resistance to...

C - Chemistry, Metallurgy

08

K

400/5015, 400/70

C08K 5/34 (2006.01) C08K 5/10 (2006.01) C08K 5/13 (2006.01) C08K 5/3437 (2006.01) C08L 101/00 (2006.01)

Patent

CA 1106523

ABSTRACT OF THE DISCLOSURE An ultraviolet light sensitive polymer com- position wherein resistance to photodegradation is en- hanced by the addition thereto of a mixture containing at least one substituted decahydroquinoline compound and at least one UV absorbing compound selected from the group consisting of benzotriazoles, benzoates and nickel phenolate complexes. This invention is also directed to methods for enhancing the resistance of ultraviolet light sensitive polymers to photodegradation.

314970

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