C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/478
C08F 246/00 (2006.01) G03F 7/038 (2006.01)
Patent
CA 1260649
ABSTRACT OF THE DISCLOSURE Novel photosensitive polymers containing pyridinium ylide moieties can be subjected to actinic irradiation to con- vert the pyridinium ylide moieties to water-insoluble or hydrophobic N-acyl-diazepine polymers. The polymeric pyridinium ylides can be used for the waterproofing or hydrophobization of surfaces and for the production of printing plates, photoresists, printed circuit boards and the like.
591570
Haubs Michael K.
Taylor Lloyd D.
Polaroid Corporation
Smart & Biggar
LandOfFree
Polymeric pyridinium ylide and products prepared from same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Polymeric pyridinium ylide and products prepared from same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Polymeric pyridinium ylide and products prepared from same will most certainly appreciate the feedback.
Profile ID: LFCA-PAI-O-1271864