Polymers containing bispyrazole units

C - Chemistry – Metallurgy – 08 – G

Patent

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Details

C08G 18/06 (2006.01) C08G 18/32 (2006.01) C08G 73/06 (2006.01) C09J 175/04 (2006.01)

Patent

CA 2077569

SK/K- 18781/A Polymers containing bispyrazole units Abstract of the Disclosure The invention relates to polymers having an average molecular weight Mn greater than 1000, consisting of identical or different repeating units of formula I Image (I), wherein R1, R2, R3 and R4 are each independently of one another hydrogen, C1-C4alkyl, C6-C10aryl or -OR5, wherein R5 is hydrogen or C1-C4alkyl, X is a direct bond or a divalent aliphatic or araliphatic radical containing up to 20 carbon atoms, and Q is a divalent alkyl, cycloalkyl, aralkyl or aryl radical or a heterocyclic radical, and to compositions comprising bispyrazole polymers of formula I.

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