C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
402/2, 400/5150
C08G 73/06 (2006.01) C08L 57/00 (2006.01) C08L 79/04 (2006.01) G03F 7/029 (2006.01) G03F 7/038 (2006.01)
Patent
CA 2034274
43302 CAN 4A ABSTRACT OF THE DISCLOSURE The present invention relates to photosensitive compounds, more particularly polymers containing halomethyl-1,3,5-triazine moieties and to radiation-sensitive compositions and elements utilizing these polymers. Migration typically occurs in photopolymerizable compositions containing low molecular weight monomers and plasticizers, which tend to diffuse between layers, carrying along other ingredients such as the photoinitiator. This invention provides radiation-sensitive organo-halogen compounds that have a photo-labile halomethyl-1,3,5-triazine moiety and a polymeric moiety within the same molecule. The compounds of this invention are comprised of a polymeric moiety having attached or incorporated within its structure at least one 1,3,5-triazine nucleus, said triazine nucleus having at least one halomethyl substituent attached to a carbon atom of the triazine nucleus. These compounds are capable of being stimulated by actinic radiation at wavelengths of from about 250 to about 900 nanometers to generate free radicals and/or acids. The compounds of this invention are useful as photoinitiators in free radical polymerization reactions, oxidation-reduction reactions, or reactions sensitive to acid, and they also exhibit the capability to crosslink upon exposure to light. The polymers of this invention are less susceptible to migration on account of the anchoring or ballasting of the halomethyl-1,3,5-triazine.
Bonham James A.
Grant Richard J.
Rossman Mitchell A.
Minnesota Mining And Manufacturing Company
Smart & Biggar
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