Polymers having silicon-containing acetal or ketal...

Details Polymers having silicon-containing acetal or ketal... Polymers having silicon-containing acetal or ketal...

G - Physics

03

F

G03F 7/075 (2006.01) C08F 8/42 (2006.01) G03F 7/039 (2006.01) G03F 7/004 (2006.01)

Patent

CA 2338523

The polymers of the present invention are characterized by having at least one pendent acetal or ketal functional group in which at least two substituents of the acetal/ketal carbon atom independently comprise at least one silicon atom. The compositions of the present invention are useful as positive working resist compositions, in particular as the top imaging layer in a bilayer resist scheme for use in the manufacture of integrated circuits.

Les polymères de la présente invention sont caractérisés en ce qu'ils présentent au moins un groupe fonctionnel acétal ou cétal pendant dans lequel au moins deux substituants de l'atome de carbone d'acétal/cétal comprennent indépendamment au moins un atome de silicium. Les compositions de la présente invention sont utiles en tant que compositions de résist positif, en particulier en tant que couche d'imagerie supérieure dans une combinaison de résist bicouche utilisée dans la production de circuits intégrés.

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