C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
402/476
C08F 20/58 (2006.01) C08F 20/60 (2006.01) C08F 22/00 (2006.01) C08F 26/06 (2006.01)
Patent
CA 1339386
A compound represented by the following formula: (SEE FIG. I) wherein R is a C3-C24 olefinically unsaturated organic radical having functionality which renders the nitrogen atom electron deficient, the olefinic unsaturation functionality being polymerizable, R1 is hydrogen or a C1-C4 alkyl radical, or R and R1 together with the nitrogen atom can form an olefinically unsaturated 5 to 7-member ring which has functionality that renders the nitrogen atom electron deficient and the olefinic unsaturation functionality is polymerizable, R2 and R3 are hydrogen, a C1-C4 alkyl or acyl radical, or R2 and R3 together are a C2-C4 alkylene group, R4 is hydrogen or a C1-C4 alkyl, acyl, ester, amide or acid group, and n is an integer from 1 to 10, provided n is not 1 when R is (meth) acryloyl, R2 and R3 are methyl and R1 and R4 are hydrogen. Under acidic conditions the above compounds in which R1 is hydrogen afford cyclic hemiamidals and hemiamide ketals of the following formula: (SEE FIG.II) The dialkyl acetal and ketal compounds and the cyclic hemiamidal and hemiamide ketal compounds can be homopolymerized or polymerized with other copolymerizable monomers.
615971
Burgoyne William Franklin Jr.
Dixon Dale David
Goldstein Joel Erwin
Pinschmidt Robert Krantz Jr.
Air Products And Chemicals Inc.
Mcfadden Fincham
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