C - Chemistry – Metallurgy – 08 – K
Patent
C - Chemistry, Metallurgy
08
K
400/3001, 400/63
C08K 5/07 (2006.01) C08K 5/132 (2006.01) C08K 5/3475 (2006.01) C08K 5/45 (2006.01) C08K 5/524 (2006.01) C08L 51/08 (2006.01)
Patent
CA 1195024
ABSTRACT A polyphenylene ether resin composition comprising (A) a polyphenylene ether resin, (B) at least one compound selected from the group consisting of 2-(o-hydroxyphenyl)benzotriazoles represented by the following formula (I) Image (I) wherein R1, R2, R3 and R4 are identical or dif- ferent and each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group, an alkoxycarbonylalkyl group, an aryl group or an aralkyl group, and X rep- resents a halogen atom, and 2-hydroxybenzophenones represented by the following formula (II) Image (II) wherein R5 represents a hydrogen atom, a hydroxyl group or an alkoxy group, R6 rep- resents a hydrogen atom or a hydroxyl group, R7 represents a hydrogen atom or a sulfonic acid group, and R8 represents a hydrogen atom, an alkyl group or an aromatic acyl group, (C) an organic phosphite, and (D) a sterically hindered phenol.
431747
Masu Masanobu
Okabe Masao
Sugio Akitoshi
Ukita Eiji
Mitsubishi Gas Chemical Company Inc.
Smart & Biggar
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