Polyphosphazene polymers containing monoetheroxy and...

C - Chemistry – Metallurgy – 08 – G

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402/355, 260/457

C08G 79/04 (2006.01) C08G 79/02 (2006.01) C08L 85/02 (2006.01)

Patent

CA 1135714

Abstract of the Disclosure Polyphosphazene polymers are prepared which contain repeatinq units represented by the formulas: Image wherein X is R(OR')nO- in which R is alkyl containing from 1 to 20 carbon atoms, aryl, alkylaryl or arylalkyl, R' is an alkylene radical and n is an integer from 1 to 70; wherein X' is X ox is selected from the group consisting of substituted or unsubstituted alkoxy, alkenyloxy, aryloxy, alkenylaryloxy, amino and mercapto groups and wherein 20 ? (a + b + c) ? 50,000 per polymer. The polymers of the invention can ce utilized to form films and may also be utilized in applications for moldings, coatings, foams and the like.

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