Polyunsaturated diazonium compounds

Details Polyunsaturated diazonium compounds Polyunsaturated diazonium compounds

C - Chemistry, Metallurgy

07

C

C07C 271/58 (2006.01) C07C 271/26 (2006.01) C07D 231/56 (2006.01) C07D 277/82 (2006.01) C07F 9/00 (2006.01) G03F 7/016 (2006.01) G03F 7/027 (2006.01)

Patent

CA 2083545

ABSTRACT IMPROVEMENTS IN OR RELATING TO POLYUNSATURATED DIAZONIUM COMPOUNDS Polyunsaturated diazonium compounds suitable for use in negative working radiation sensitive compositions are provided. They may be produced by reacting an aromatic diazonium compound of the formula (A-N2+)p - Ar - (R)q - (XH)r with a polyethlenically unsaturated monoisocyanate compound of the general formula Image where p and q are integers ranging from 1 to 5, r is an integer ranging from 1 to 10; Ar represents a substituted or unsubstituted divalent or polyvalent radical derived from an aromatic or heteroaromatic compound; X represents O, S or a secondary or tertiary amino group; R represents a single bond or a substituted or unsubstituted divalent or other polyvalent radical and may be the same or different when q is greater than 1; A- represents an anion; Z represents the residue of a polyisocyanate OCN-Z- (NCO)n where n is 1 or 2; and Y is the residue of a monohydroxy compound of the formula YOH where Y contains at least two ethylenically unsaturated double bonds.

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