C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
96/167, 400/4304
C08F 8/28 (2006.01) G03C 1/00 (2006.01) G03F 7/016 (2006.01) G03F 7/021 (2006.01) G03F 7/033 (2006.01)
Patent
CA 1276048
ABSTRACT OF THE DISCLOSURE A resin comprising units of each of the general types A, B and C, in an ordered or random sequence, wherein A is present in an amount of from 5 % to 20 % by weight and is a unit of the formula Image B is present in an amount of from 4 % to 30 % by weight and is a unit of the formula Image and C is present in an amount of from 50 % to 91 % by weight and comprises units of each of the formulae C I, C II and C III Image Image Image (C I), (C II), (C III) where R is lower alkyl or hydrogen, and wherein said units C I are present in an amount of from 75 % to 85 %; units C II are present in an amount of from 3 % to 5 %; and units C III are present in an amount of from 10 % to 22 %, based on the total weight of the units C. Resins of this type may be used in the production of a photosensitive composition.
515174
Dhillon Major S.
Duyal Tulay
Koletar Gabor I.
Tellechea Carlos
Walls John E.
Dhillon Major S.
Duyal Tulay
Fetherstonhaugh & Co.
Hoechst Celanese Corporation
Koletar Gabor I.
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