Porous materials functionalized by vacuum deposition

Details Porous materials functionalized by vacuum deposition Porous materials functionalized by vacuum deposition

C - Chemistry, Metallurgy

23

C

C23C 16/00 (2006.01) B05D 3/00 (2006.01) B32B 3/26 (2006.01) B32B 9/00 (2006.01)

Patent

CA 2522841

A porous substrate (12) is pretreated in a plasma field (20) and a functionalizing monomer is immediately flash-evap-orated (22), deposited and cured (24) over the porous substrate in a vacuum- deposition chamber (10). By judiciously controlling the process so that the resulting polymer coating adheres to the surface of individual fibers in ultra-thin layers (approximately 0.02-3.O micrometers) that do not extend across the pores in the material, the porosity of the porous substrate (12) is essentially unaffected while the fibers and the final product acquire the desired functionality. The resulting polymer layer is also used to improve the ad-herence and durability of metallic and ceramic coatings.

Selon la présente invention, un substrat poreux (12) est prétraité dans un champ de plasma (20) et un monomère de fonctionnalisation est immédiatement évaporé (22), formé par dépôt et réticulé (24) sur le substrat poreux dans une chambre de métallisation par évaporation sous vide (10). La régulation judicieuse du processus permet, d'une part, l'adhésion du revêtement polymère résultant sur la surface de fibres individuelles en couches ultra-fines (approximativement entre 0,02 et 3 O?m) qui ne s'étendent pas à travers les pores de la matière et, d'autre part, la stabilité pratiquement constante de la porosité du substrat poreux (10), tandis que les fibres et le produit final acquièrent la fonctionnalité souhaitée. La couche polymère résultante est également utilisée pour améliorer l'adhérence et la durabilité de revêtements en métal et en céramique.

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