Positive acting photoresist composition and imageable element

B - Operations – Transporting – 41 – M

Patent

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Details

B41M 5/36 (2006.01) B41C 1/10 (2006.01) C08F 8/28 (2006.01) C08L 29/04 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2380570

A positive acting, composition that can be heat-sensitive is presented, either coated on a lithographic base, or on a printing circuit board base, and comprises a water soluble heat-sensitive resin, a novel adhesion promoter and a radiation absorb-ing agent - a dye or a pigment. An excellent film forming polymer that comprises acetal units directly pendant from the polymer polyvinyl alcohol backbone may be the only binder resin, when other resins being optional. The solubility of the coated material in the areas exposed to near-IR laser radiation in mild alkaline developers becomes considerably higher, allowing to obtain high resolved patterns of the etch-resistant material on printing circuit boards or lithographic printing plates. The composition can be applied on the substrate from a liquid of laminated as a dry film. Sensitizers may be added to render the composition sensitive to radiation in a non-thermal sense.

L'invention concerne une composition positive pouvant être thermosensible, recouvrant soit une base lithographique soit une base de carte de circuit imprimé, comprenant une résine thermosensible et hydrosoluble, un nouveau promoteur d'adhérence et un agent d'absorption des rayonnements, tel qu'un colorant ou un pigment. Un polymère très feuillogène comprenant des unités d'acétal pendantes directement du squelette de l'alcool polyvinylique du polymère peut être le seul liant de la résine, d'autres résines étant facultatives. La solubilité du matériau de revêtement dans les zones exposées à un rayonnement laser infrarouge proche dans des révélateurs faiblement alcalins croît considérablement, ce qui permet d'obtenir des motifs à haute résolution du matériau résistant à la gravure sur des cartes de circuits imprimés ou sur des plaques lithographiques. Cette composition peut être appliquée au substrat à partir d'un liquide ou stratifiée, comme un film sec. On peut ajouter des agents photosensibilisants afin de rendre la composition sensible aux rayonnements de manière autre que thermique.

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