Positive photoactive compounds based on 2,6-dinitrobenzyl...

C - Chemistry – Metallurgy – 07 – C

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96/172, 260/491,

C07C 205/11 (2006.01) C07C 205/19 (2006.01) C07C 205/26 (2006.01) C07C 215/14 (2006.01) C07C 323/25 (2006.01) C08G 18/38 (2006.01) C08G 59/50 (2006.01) C08G 63/685 (2006.01) C09D 163/00 (2006.01) G03F 7/004 (2006.01) G03F 7/039 (2006.01) G03F 7/16 (2006.01)

Patent

CA 2195014

The present invention is an approach to positive acting photochemistry which yields a substantial improvement in quantum efficiency by the use of photoreactive compounds synthesized from monomers including: Image where X and Y may be the same or different member selected from the group consisting of: halogen, -OH, -OR, -O-SO2R, -SR, and NRR'. R and R' may be hydrogen or any of a wide variety of organic substituents, including substituted or unsubstituted alkyl, aryl, or aralkyl substitutents. If further reaction to form adducts or polymers is desired, the R or R' groups may include a reactive group such as a hydroxyl group. After exposure to radiation such as ultraviolet light, the bond is broken between the carbon and the X in the CH2X group, thus providing photoactivity to the compounds of the present invention.

L'invention porte sur des composés photoréactifs synthétisés à partir de groupes 2,5- ou 2,6-dinitrobenzyle et sur des méthodes de synthétisation de monomères réactifs contenant lesdits groupes.

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