C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
96/172, 260/491,
C07C 205/11 (2006.01) C07C 205/19 (2006.01) C07C 205/26 (2006.01) C07C 215/14 (2006.01) C07C 323/25 (2006.01) C08G 18/38 (2006.01) C08G 59/50 (2006.01) C08G 63/685 (2006.01) C09D 163/00 (2006.01) G03F 7/004 (2006.01) G03F 7/039 (2006.01) G03F 7/16 (2006.01)
Patent
CA 2195014
The present invention is an approach to positive acting photochemistry which yields a substantial improvement in quantum efficiency by the use of photoreactive compounds synthesized from monomers including: Image where X and Y may be the same or different member selected from the group consisting of: halogen, -OH, -OR, -O-SO2R, -SR, and NRR'. R and R' may be hydrogen or any of a wide variety of organic substituents, including substituted or unsubstituted alkyl, aryl, or aralkyl substitutents. If further reaction to form adducts or polymers is desired, the R or R' groups may include a reactive group such as a hydroxyl group. After exposure to radiation such as ultraviolet light, the bond is broken between the carbon and the X in the CH2X group, thus providing photoactivity to the compounds of the present invention.
L'invention porte sur des composés photoréactifs synthétisés à partir de groupes 2,5- ou 2,6-dinitrobenzyle et sur des méthodes de synthétisation de monomères réactifs contenant lesdits groupes.
F. II Kahle Charles
Kollah Raphael O.
Mccollum Gregory J.
Mcmurdie Neil D.
Rardon Daniel E.
Borden Ladner Gervais Llp
Ppg Industries Inc.
Ppg Industries Ohio Inc.
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