Positive photoresist composition

Details Positive photoresist composition Positive photoresist composition

G - Physics

03

F

96/166

G03F 7/022 (2006.01) C08G 8/12 (2006.01) G03F 7/023 (2006.01) G03F 7/038 (2006.01)

Patent

CA 2029464

ABSTRACT OF THE DISCLOSURE A positive photoresist composition consisting essentially of a photosensitive component comprising an ester of 2,3,4,4'- tetrahydroxybenzophenone, having on the average, greater than 3.2 of the hydroxy groups of the 2,3,4,4'-tetrahydroxybenzophenone esterified by 1,2-naphthoquinonediazide-5-sulfonic acid; and a water insoluble, aqueous alkali soluble novolak resin obtained by condensing with formaldehyde a mixture of from about 2.0 to about 5.0 mol percent of 2,4-xylenol, from about 1.5 to about 4.5 mol percent of 2,5-xylenol, from about 1.5 to about 4.0 mol percent of 2,6-xylenol, from about 2.0 to about 5.0 mol percent o- ethylphenol, and the balance m-cresol and p-cresol in a respective mol ratio of from about 0.5 to about 2.0 to 1.

Affiliated with

Also associated with

Rating

Positive photoresist composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Positive photoresist composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Positive photoresist composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1514471